The invention provides a polishing pad useful for polishing at least one of semiconductor, magnetic and optical substrates. 1 psnm2km, said fiber being characterized in that it further presents the following features for a wavelength of 1550 nm:. The methods described herein may be used in the formation of sub-22 nanometer channels, which find use in field-effect transistors, electronic chips, nanoscale biosensors, photonic band gap devices, lasers in optoelectronics and photonics chips, as well as nano-electro-mechanical devices. Using standard photolithographic processing, a pattern is formed with the photosensitive material to expose at least one region of the metal layer. The display is used to provide maintenance information to a maintenance engineer to facilitate maintenance of the rack mounted equipment.