A method of forming a strained, semiconductor-on-insulator substrate includes forming a second semiconductor layer on a first semiconductor substrate. 30 or higher; a free radical polymerizable photosensitive layer; and a water soluble or dispersible overcoat. System resources are reallocated to improve the responsiveness. A second electromagnet is disposed in a travelling reaction mass, which is movably disposed in the frame between the first electromagnet assembly and the top block.