An exposure apparatus and an exposure method according to the present invention comprise an average illuminance operation unit for averaging illuminance values obtained from four illuminance meters provided on a stage and obtaining average illuminance and a light exposure control unit controlling a light exposure on the basis of information obtained from the average illuminance operation unit. At least one conductor and support member are positioned within the channel to substantially resist deformation of the outer sheath. The capacitor can be completed by forming a dielectric layer over the lower electrode, and an upper electrode over the dielectric layer. Resampling to enforce point correspondence is performed during mesh editing. The second connector includes second terminals connected to the first terminals.