A method for manufacturing a sputtering target with which an oxide semiconductor film with a small amount of defects can be formed is provided. Measuring the duration of such flow and the number of times the urinal is used will determine, in accordance with preset criteria, when servicing or replacement is needed, and alerts a service person to that effect by a warning light or other signal. The latched row and column addresses are then provided to a combining circuit. The reamer is connected to the driver head. The measured fractional localized intensities are compared to determine translocation of cellular material among the measured components caused by the agent.