The invention relates to a method and apparatus with which an organic solution that is slightly soluble in water is scrubbed of aqueous entrainment and impurities. It comprises an anode structure and a cathode structure, each having an essentially pointed portion, wherein at least the pointed portions being directed towards each other and enclosed in a vacuum cavity. Each outlet tine has a free end near to which a plug contact is adapted to touch and each outlet tine has a fixed end coupled through a corresponding conductive trace to a corresponding conductive wire termination contact. In this apparatus 10, fluorine-containing silicon oxide film is deposited on wafer 14 by generating the plasma of process gas containing SiH4, SiF4 and N2O.