The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The wrench may be capable of holding two separate nuts and have cooperating mating structure to slidably mate with the mounting rail of the tamper switch arrangement. Also, surface stickiness may be prevented in the cured product without causing turbidity etc. Thus, the seal durability of the metal gasket is improved by effectively preventing fretting wear.