The invention relates to a machine tool having a two-part housing. At least a concave or convex pattern is formed intentionally on a insulating film provided in contact with the lower surface of an amorphous silicon film, whereby at least a site is formed in which a metal element for accelerating crystallization can be segregated. The depth of the cavity in the shuttle is approximately the same as the thickness of one of the objects. The profile location may contain many different types of data such as speed dial lists, media preferences, preferred product classifications, etc. represents a single bond or a double bond; m represents 1 or 2; n represents an integer of 0 to 5; Substituent Group A represents a halogen atom, a C1-C6 alkyl group, a C1-C6 halogenated alkyl group, a C1-C6 alkoxy group, or the like; and Substituent Group B represents a C3-C6 cycloalkyl group, a phenyl group, a carboxyl group, or the like.