A portion of a bulk silicon is formed into a fin, having a fin base and, on the fin base, an in-process fin. Additionally, because the main solvent of the composition is water, the disclosed photoresist composition is environment-friendly, and has a low light absorbance at 193 nm and 248 nm, which is useful in a photolithography process using a light source in a far ultraviolet region when high-integrated fine circuits of semiconductor device are manufactured. The trace is configured to transfer an electrical signal between the first signal terminal and the second signal terminal.