A method and apparatus of planarizing substrates is disclosed. By using this compound as a starting material, there can be obtained a polythioether or a sulfur-containing polyether having, in addition to excellent optical properties, excellent mechanical properties and a high glass transition temperature. The remote host machine also includes an active server process. Therefore, the heat generated by the luminary element directly dissipates at the dissipating end of the supporting frame so as to prevent the light head from overheating. The buildup structure has an opening portion formed such that the light receiver of the imaging device is exposed from the opening portion of the buildup structure, and the insulation layers in the buildup structure include a first insulation layer formed on the first surface of the substrate.