A focusing-device for the radiation from a light source, in particular a laser plasma source, has a collector mirror which collects the light from the light source at a second focus in virtual or real terms, in particular for micro-lithography using EUV radiation, and a routing unit and downstream beam formation in an illuminating system. The method further includes determining whether the execution of the process request can be delayed to a future time or not based on the current state, the power consumption, and the urgency, and causing the execution of the process request, or causing a delay of the execution of the process request to the future time, based on a result of the determining. A display orientation module automatically determines an orientation of the first display with respect to the one or more additional displays that form the larger display matrix.