To provide a mask able to reduce the thickness of a membrane and maintain the mask strength and a method of producing a semiconductor device able to form a fine pattern with a high accuracy and a method of producing the mask. A photonic signal, comprised of one or more channels, is received, characterized, and assigned to one or more channels. The present invention also provides exemplary drivers that can be used with the various methods and devices disclosed herein, or with other methods and devices known in the art. The drive feature decouples the abutment from the lock lever when the manually actuable element is actuated in an attempt to move the lock lever from a superlocked position, allowing the abutment to move relative to the lock lever.