A sputtering cathode for coating processes in a vacuum chamber comprises one at least single-piece target plate mounted on a metallic diaphragm. The media stream is monitored by a monitoring device and a packet pattern of the media stream is evaluated. A microelectronic package is also disclosed that uses the molding compound cap structure. The fluid may also be groundwater that is circulated throughout the system in a semi-open loop arrangement. Then, the abutment segment, the guide magnet and the implanted magnets are moved as a group away from the implantation site. Some embodiments provide for a technology for the precision switching that enables IGBT power modules to operate robustly in a series configuration andor a parallel configuration to produce precision switching at high voltage and high frequencies.