The present invention provides systems and methods wherein scatterometry is used to control an implant processes, such as an angled implant process. The method includes the steps of providing at least one opening in a face of the solid surface and inserting a plaque support into the at least one opening. In the low-side mix mode, the direct digital frequency synthesizer is initialized to output the digital local oscillator signal at a second frequency suitable for performing a low-side mix of the desired channel to said IF.