A CMOS image sensor and a method for fabricating the same are disclosed, in which light that transmits through a microlens is prevented from being beyond a photodiode region to minimize loss of incident light and to improve low illumination characteristics of the CMOS image sensor. A part-information acquiring unit acquires information including a symbol of the first connector. The electrode terminal protrudes outwardly from a terminal hole of the cap plate. A direction of summed horizontal components of a fringe field at an edge of the pixel region is substantially equal to a direction of summed horizontal components of a pretilt direction of the at least one of the first and second alignment layer. One or more of a plurality of classifiers are selected based on the layout of the one or more logical structures in the input character. If more than one process flow is modeled, various parameters are modified iteratively until a unique process flow model is synthesized.