A photolithography mask is based on a combination of a half-tone phase mask and an alternating phase mask such that, when the radiation passes through some of the openings, a phase difference is in each case produced between adjacent openings, and the surroundings of the openings are partially transparent and shift the phase of the radiation. In accordance with one embodiment, a method is provided for creating a package that contains one or more content updates configured to change the content that is displayed by default when a program executes. The guard trenches receive guard trench conductors via guard trench insulators for enabling the IGBT to withstand higher voltages through mitigation of field concentrations. The plurality of search result items are provided to a user with an indication of each search mode in the plurality of search modes. The delay control circuit detects a phase difference between state transitions of the first and second switches and provides a delay corresponding to a magnitude of the phase difference.