1460694126-9c4c8a40-dfbf-41e1-9e20-639f7f4d45fa

Embodiments of the invention provide a method and an apparatus for performing self-aligned, sub-wavelength optical lithography. The biasing projection penetrates the bottom of the recessed portion and projects from a back surface side thereof. The method also includes generating a first plurality of silhouette images associated with the bare hand based on an IR light contrast between the bare hand and the background surface and generating a second plurality of silhouette images associated with the bare hand based on an IR light contrast between the bare hand and the background surface. All tuners receive the same signal and no signal degradation is caused when connecting multiple tuners. A mold is provided for blow-molding the article from a tubular parison.