A method and apparatus for aligning a charged particle beam with an aperture includes providing a hollow beam aperture device adapted for shaping a charged particle beam into a hollow charged particle beam. Each micro chamber includes an upper chamber portion defining an upper working surface and a lower chamber portion defining a lower working surface. , in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern to be thickened; and which is suited for forming a fine space pattern or the like, exceeding exposure limits. A delay section is disposed in the second optical fiber.