The invention relates to an exposure apparatus, in particular for wavelength-dependent light outcoupling, in which at least one preferably wavelength-dependent mirror layer is located within an exposure beam path of a lamp, which mirror layer is used to divide the beam path into a spectral portion used for exposure, and into an unused spectral portion. An electrical conductive material is formed on a printed substrate. One end of the multiple cascades is connected with an inter-cascade link, and the inter-cascade link has a logically connected state and a logically disconnected state. The arm is further configured for being secured against a second vehicle when the housing is connected with the first vehicle. The retainer may be moved along the portions of the suture while the retainer is gripped by an applicator assembly. Calibrate coarsely a frequency of an oscillator according to a width of an end-of-packet of the series of digital data.