In device fabrication, a photoresist layer is formed on an insulation layer, above a stop layer that is supported directly on an active device structure. The sieve bed vessel at least partially supports one chassis component of the oxygen concentrator with respect to another chassis component. Based on these gradients, the encoder predicts image information based on image information of either the horizontally adjacent block or a block vertically adjacent to the new block. The second and third corrugate mechanisms, in one or more arrangements, may be located downstream of the first corrugate mechanism and an ink nozzle. The upper wall rests horizontally on the side wall and the weight of the upper wall weighs directly on the side wall, without stressing the adhesive with which they are glued, ensuring the safety of the showcase; furthermore, the junction line between the walls is not visible on the side wall, since the outer bound of the contact bands does not reach the outer face of the side wall. An amount of R32 for filling the refrigerant circuit is set to be in a range of 120 g to 450 g per kW of refrigerating capacity, or an amount of R32 for filling the refrigerant circuit is set to be in a range of 400 g to 750 g per liter of unobstructed capacity of the condenser.