Alignment methods of IC device substrates. The episode data include at least an episode classification resulting from the automatic adjudication of the episode and a confidence level in the episode classification. The photo polymerization resin includes oligomer particles in an emulsion state and monomers which reside in the oligomer particles. The outer tip surface, including the fin structure, is constructed and arranged to be heated by combustion gases so that the outer tip surface reaches a temperature greater than a temperature that the outer tip surface would reach absent the fin structure, so as to cause evaporation of fuel that contacts the outer tip surface. The stabilizers include a first cyclic amino methane diphosphonic acid compound stabilizer in combination with a second phosphonic acid based stabilizer, wherein the weight ratio of the first stabilizer to the second stabilizer is at least about 2:1. Once the substrates are assessed to achieve the desired uniformity, the substrates are exposed by the exposure apparatus in accordance with the corrective exposure data, the uniformity of the exposed substrate continues to be monitored and the dose corrections are updated as required to maintain uniformity.