A crush stop comprising a thermoplastic elastomer composition which has a hardness as measured with a hardness tester type A in accordance with JIS-K-6253 being at least 50 degrees and which has dependence of elastic modulus upon temperature being at most 3 times between 0 C. , which corresponds to a semiconductor with a microstructure and a high aspect ratio. The microphone array may include a first microphone positioned a first distance from the speaker and a second microphone positioned a second distance from the speaker. The resulting first and second original mask images recorded in the hologram recording material can be simultaneously replayed to produce an exposed pattern approximating an exposed pattern of a non-holographic phase shifting photomask.