A method for monitoring polishing process parameters for an integrated circuit structure on a substrate. A diffuser is housed within that jet body and is rotatable within the jet body to control the amount of water flowing into the jet body. The storage location of the content addressable memory includes a plurality of CAM cells, each CAM cell a first thyristor and second thyristor. Detecting and classifying may be cumulatively performed in less than one second. Various combinations of other optional ingredients are also disclosed.