A method and system for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. The proton exchange membrane has two opposite surfaces, a first surface and a second surface. The distance between the cover and the rotation axis of the clutch is smaller than the distance between the outer end of the inner and the rotation axis. Additionally, a cross brace is provided that is removably installed onto the two complimentary brackets to provide additionally rigidity to a rack while a chassis is being installed.