The exposure apparatus comprises: a barometer for detecting air pressure, a lens driving unit for driving a lens of a projection optical system, a light-source-wavelength changing unit for changing a wavelength of an exposure light source, and a stage driving unit for driving a wafer stage in the optical-axis direction. A monitoring application within an Access Node of the LAN monitors the LAN conditions through the LAN management system. The bladder assembly also includes a viscous fluid contained in the first or second chamber and a gas contained in the other of the first or second chamber. The arms are slidable in a transverse direction to the side rails. Based on responses from second host to the ICMP packets, the first host estimates a throughput between the first host and the second host. In some instances, methods of fabricating semiconductor devices with high-kmetal gate features are disclosed that prevent or reduce high-kmetal gate contamination of non-high-kmetal gate wafers and production tools.