Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Two or more auxiliary storage systems 100B, 100C are connected to a primary storage system 100A connected to a host device 180. A description is input describing an environment of the logic circuit, and the description of the environment includes a position of the logic circuit. A gas manifold with a gas passage is connected to and in fluid communication with the valve by a metal fitting.