Vacuum-integrated photoresist-less methods and apparatuses for forming metal hardmasks can provide sub-30 nm patterning resolution. Said hard material coating includes at least one inner layer and one outer layer, wherein the biocide concentration in the outer layer is substantially constant and greater than the biocide concentration in the inner layer and the biocide concentration in the inner layer is greater than or equal to 0. The methods and apparatuses comprise estimating a vehicle response resulting from the operation of the plurality of thrusters to form an estimated vehicle response. A bean chamber is provided in the grinder, and under the bean chamber is provided a grinding unit, the grinding unit including a bean grinding chamber in which a rotating grinding plate and a stationary grinding plate are provided.