A method embodiment for patterning a semiconductor device includes forming a plurality of mandrels over a substrate, and forming a multilayer spacer layer over the plurality of mandrels. In one example embodiment of the present invention, a light source is directed to a semiconductor analysis arrangement using, for example, a fiber optic cable. Garments can be configured for training various athletic motions. The post extends upwardly from the base into an opening in the adhesive, the base extends below and laterally from the post, and the cap extends above and laterally from the post. Electrodes are interchangeable and may be straight or curved and have a dome-shaped or cut-back end face.