An electron beam evaporator, which is formed of the component assemblies: beam generator, deflection system and water-cooled cruciblerotary crucible, is fastened on the cover plate of a flat hollow body. The selection transistor includes a selection gate formed on the substrate via a second gate insulation film, and a pair of second diffusion layers formed in the substrate positioned on the opposite sides of the selection gate and one of which is electrically connected to one of the pair of first diffusion layers. The center portion has a plurality of plastic center reinforcing structures that define a plurality of center portion apertures. The automatic component mounting unit also includes a control device for communicating with a data storage device of each of the mounting members for processing an amount of process data that is specific to each of the mounting members and that is generated prior to installation. The ions of the divalent iron and the substance having caused the contaminated layer are bound to an ion exchange resin.