The invention is directed to a dynamic control system that maintains an inert gas feed at a constant target gas flow rate sufficient to prevent or reduce alumina or alloy plugging within a slide gate discharge opening. The UV sterilizer includes a body including a top surface and a sidewall, at least one first UV LED chip disposed on the top surface of the body, and at least one second UV LED chip disposed on the sidewalls of the body. The conditions when forming the resist pattern are the rotation speed when supplying the resist solution while rotating the wafer inside the resist coating unit, the exposure time in the exposing unit, the developing time in the developing unit, and so forth.