In a charged-particle-beam exposure apparatus for exposing a wafer using a charged-particle beam, an electron beam emitted from an electron source serving as a source of charged particles is substantially collimated by a collimator lens and irradiates an aperture array, which has apertures for forming a plurality of electron beams used to expose a wafer. The rear loudspeaker enclosure is in the form of a bandpass enclosure. The formulations may also include other therapeutic, prophylactic or diagnostic agents. The present embodiment then determines the optical characteristics of the sub-component by utilizing at least one portion of the optical response of the sub-component. The mobile station requests or the communication network transmits data prior to the mobile station entering the slow data rate mode, therefore eliminating the need to transmit data over a slow data rate mode, such as analog mode. In a mirror structure which is used under an environment that the maximum irradiance of incident light is 5 kWm2 or more and has an area of 0.