An adjusting device used to align two components of a microlithography projection exposure installation relative to each other. A frame is provided that has a low pivot point for a boom. The recess is a cylindrical bore retracting in the axial direction from the front surface of the rotor core, facing to a reduction gear unit, toward the rear surface of the rotor core. The bushing includes a proximal axis of alignment in alignment with the central position of the tray and a distal axis of alignment that is co-linear to the longitudinal axis of the stem. In use, where water or metal chloride solution is supplied to at least the positive electrode-side catalyst layer, an electromotive force is generated between the negative electrode and the positive current collector.