A polishing pad including a window can be useful for polishing articles and can be especially useful for chemical mechanical polishing or planarization of a microelectronic device, such as a semiconductor wafer. Each noncontainer content object is preferably stored as a separate entity in the data repository. In another embodiment, a method of removing a stain from a textile includes the steps of applying the stain removing composition to an area of application. The fixing member is provided with an abutment surface that comes into abutment with the image pickup device, an opening from which a light-incident surface of the image pickup device is exposed, and a wall portion that faces a side surface of the image pickup device.