A device for varying the capacitance of an electronic circuit is disclosed. There are two processes which result from this novel approach: diffusion control for USJ formation; and high dose carbon implantation for stress engineering. After creating a pull-up network of PMOS transistors, the technique includes arranging the order of the PMOS transistors corresponding to the respective precharge nodes to improve noise immunity and performance of the dynamic circuit. Another sequence describes WCD operation in this network. The event server binds the content to the events used to create the content in response to the request.