A spinner apparatus for manufacturing a photomask, performing a developing process for forming a resist pattern on a specific substrate, and performing an etching process in which a resist pattern is used as an etching mask are provided. The at least one column of the plurality of columns has at least one entry containing text data. A band-shaped substrate traveling in one direction is kept looped over a stationary reference-roller and a movable actuation roller, and is brought into contact with an application roller which carries a coating agent on its circumferential surface and rotates in a direction opposite to the direction of travel of the substrate. An application is selected, and the configuration registers of the transceiver are configured responsive to the application selected. The present invention clearly differentiates the jobs to be done by the MPI program and by the job submission service module in the middleware, thereby enabling the MPI program to be executed in the grid computing system regardless of the design of the middleware. The cleaning pad includes a base sheet bonded to a fiber mat and exhibits improved debris retention without leaving a residue on a surface to be cleaned when a volatile additive is applied to the pad.