Provided are a substrate processing apparatus and a method of manufacturing a semiconductor device. Specifically, the present invention utilizes a Si-containing semiconductor substrate having a crystal orientation in which the substrate is rotated by about 45\xb0 such that the CMOS device channels are located along the <100> direction. Circuitry for the device may be provided to prevent electrical shock, power surges and thermal overload, and a switch may be proved for operation by an operator wearing protective clothing, such as heavy gloves. The television signal is then sent from the windows management application to a television where it is displayed. Each of the microreliefs has an outer surface and a base area. The memory offset specifies a location in the memory from which to begin reading the signal samples obtained from the second signal source.