Filters for EUV lithography, methods of manufacture thereof, and methods of filtering in an EUV lithography system are disclosed. The controller is operable to supply a first power the electric blower if the mode detector detects that the cleaner body inclines, and to supply a second power lower than the first power to the electric blower if the mode detector detects that the cleaner body stands. Rear end openings of the tubular housings are closed by a tubular housing at a finger root and a tubular housing at a finger body section. The expander receives the exhaust gases from the combustor, and expands the exhaust gasses.