A process chamber and a method for controlling the temperature of a substrate positioned on a substrate support assembly within the process chamber are provided. A first rendering path operates by receiving display requests and rendering bit-mapped graphics in a local screen buffer. A comparator is coupled to the at least one detector to receive and process the at least one output and to provide a control output. In response to the power train outputs, the control assembly provides control signals to each power train. Certain embodiments may also include one or more features that improve the process of mounting the support ring onto a rim and better tolerate variations, within manufacturing tolerances, in the respective diameters of the rim and the support ring. The component and the substrate to be connected are displaceable separate from one another in the chamber, and the chamber comprises a combined transfer and pressing unit being displaceable between the current position of the component and the current position of the substrate, for placing and pressing the component on the substrate.