An electrostatic chuck 108 is provided on a lower electrode 106 provided inside a processing chamber 102 of an etching apparatus 100, and a conductive inner ring body 112a and an insulating outer ring body 112b are encompassing the outer edges of a wafer W mounted on the chuck surface. The sail panel may be attached with an inflatable curtain of the curtain airbag system. The hardware may also be specially tailored to the services required by the database server.