Systems and methods of monitoring thin film deposition are described. The device includes a substrate and a polymeric layer including poly or poly supported by the substrate. The feature comparison means disposes the feature points extracted from the existing mark in the predetermined space, and judges that the existing mark is capable of being used as a marker which is detectable from the image, when the number of feature points that coincide with the singular features is equal to or more than a predetermined number. In still another embodiment of the invention there is provided a method of fabricating a semiconductor structure including providing a semiconductor substrate, providing at least one first crystalline epitaxial layer on the substrate, and planarizing the surface of the first layer.