When an apparatus is turned on, one developer is positioned to a readingwriting position and a specific area of a cartridge memory is read to judge whether or not an improper detachment flag is set. Most of the components and devices are particularly adapted for use in wavelength division multiplexing systems and in particular for use in switchable adddrop filtering and wavelength selective crossconnect. Then, ions of an impurity are implanted into a semiconductor substrate while using the photoresist film and the gate electrodes as a mask, and p-type pocket regions, extension regions, and impurity regions are thereby formed. The metal contacts to the underlying semiconductor device, are formed using a polymethylmethacrylate etch back process for exposing and dissolving the gold metalization layer save the metal contact under a surviving portion of the etched back PMMA layer in a dimple of the gold layer over the photoresist via.