A device generates andor influences electromagnetic radiation from a plasma, for the lithographic production of semiconductor elements. It consists of a tank suspended upon a base and moved by a vibrating device, having a treatment channel designed to receive a drying material and the articles for treatment. The valve body is provided with a fuel inlet in fluid communication with the secondary fuel source to receive the secondary fuel from the secondary fuel source, a fuel outlet, and a fuel passage between the fuel inlet and the fuel outlet. The bonding occurs under a temperature ranging from about 23 C.