Embodiments for controlling exhaust air-fuel ratio are provided. Accordingly, in the resist pattern forming method of performing bake processing at a temperature not lower than a glass transition temperature, a process margin for resist removability cannot be ensured, so that there is the problem that it is impossible to compatibly realize both the formation of a resist pattern having the desired sidewall angle and the resist removability of the resist pattern. The navigation system may also distinguish between a beacon light source and a non-beacon light source.