Systems and methods for near-field photolithography utilize surface plasmon resonances to enable imaging of pattern features that exceed the diffraction limit. At rest, the surfaces are congruent in the frontal plane of the articulation in the area of the condyles and non-congruent in the sagittal plane. Results may be displayed electronically or on a hard copy for viewing or used in additional analysis of a market. The invention encompasses methods of using such resist compositions in forming a patterned structure on a substrate, and particularly multilayer photolithographic methods, which methods are capable of producing high resolution images at wavelengths such as 193 nm and 157 nm. The gas turbine inner flow path cover piece can include a main body having an first surface and a second surface, side pieces disposed on the first surface of the main body and mating pairs disposed on the second surface of the main body.