The present invention provides a nanowire production method that is simpler than conventional nanowire production methods, and that makes it easier to control the size and shape of the nanowires by using a technique completely different from the conventional ones. The photosensitive region and the trench are disposed within the semiconductor layer. The manufacturing method of the present invention comprises the steps of dyeing, setting, performing an underlayer surface treatment to form an underlayer on a surface of the fabric, and performing a soil resistance processing treatment to form a soil-resistant protection film on the surface of the underlayer. A supply configurator receives manufacturing and planning data from a planning source and manipulates the received manufacturing and planning data to create new supply data. The composition may be in the form of hair products, skincare products, make-up products or antisun products. The coupling agent X function is an ester function of an unsaturated \u03b1-\u03b2 acid bearing a carbonyl group on its \u03b3 position and having the general formula :where R, R1 and R2 may be the same or different, where R is a monovalent hydrocarbon radical, and where R1 and R2 may be a hydrogen atom or a monovalent hydrocarbon radical.