A coal formation may be treated using an in situ thermal process. The semiconductor structure includes a substrate, a first material layer and a second material layer. Enough Al3 ions enter solution, at the low pH, to cause all the phosphate-P to precipitate as aluminum phosphate, and nothing else precipitates other than the aluminum phosphate. As a response to an indication of a certain recipient having accessed said piece of information or service, an account associated with said certain recipient is credited. Once the soft handoff is complete, the second base station resumes FPC and RPC processing.