The present invention is an apparatus and method for extending the life of abrasive disks used in the conditioning of polishing pads used in chemical mechanical planarization of polishing pads used to polish andor planarize the surfaces of semiconductor wafers during the production of integrated circuits. Each fiber is held in a ferrule that aligns the fiber with a focusing device. Training breaks are scheduled at various times throughout the day that can depend on the workload of the call center. The oligonucleotides and detection methods of the invention are useful e.