An improved optical configuration for use in a gas monitoring system. In an upper case cover 3 are formed an ink filling hole 13 communicating with the second ink chamber 10 and a pressure reduction hole 14 communicating with the atmosphere connection chamber 11. Exposure affects the solubility of exposed portions of the applied and treated layer relative to unexposed portions of the applied layer. The lens array is placed above the micro-electrical-mechanical structure. The inner shutter is provided so as to be movable to such a position as to create communication between the toner storing portion and the toner discharge port in linkage with rotation of the screw auger. The high-energy ion implanter of the present invention is capable of preventing an unsuccessful ion implanting process by suspending operation thereof when abnormal operating conditions are detected.