A thermal storage bare surface cleaner comprises a cleaning implement wrapped over a cleaning head and positioned between the cleaning head and the surface to be cleaned. The arm member is constructed in such a way that the width of its coil side end and the width of its suspension side end are narrower than that of its intermediate area. The layer of colored fluid has a thickness and a color. The high voltage circuit is coupled to the output of the step-up voltage converter. The method further includes processing the first mask according to the processing data thereby forming a first portion of a pattern of the semiconductor device on the first mask, the first portion of the pattern excluding the defect region.