There is provided a semiconductor device manufacturing apparatus and a semiconductor device manufacturing method capable of recovering a damage of a low dielectric insulating film exposed to CO2 plasma to obtain the low dielectric insulating film in a good state, thus improving performance and reliability of a semiconductor device. Air pressure is applied within the tube wall, at a station in the line, on one side of the seal, and the pressure is monitored on the other side of the seal within a reciprocating cover, for any increase in pressure which would indicate a leak in the seal. The dog is introduced to the distinctive scent and encouraged to chew the marked acceptable chewing object. The coated particles are useful as fillers for electronic packaging applications, for making ceramic or cermet parts, as supported catalysts, as well as other applications. The flexible membrane includes a bimorph actuator that causes the flexible membrane to move from a first position to a second position to eject liquid through the nozzle of the first liquid chamber. The torque line indicates a line for obtaining a desired torque in a subsequent control period.