Supercritical carbon dioxide may be utilized to remove resistant residues such as those residues left when etching dielectrics in fluorine-based plasma gases. The encrypted version is constructed as encrypted code blocks that are decrypted and loaded into the memory only as required, and the encrypted version of the program includes a clear text header identifying the encrypted version as an encrypted program. A side electrode which connects the main surface electrodes, and a side electrode which is conducted to the internal electrode are formed on the side surface of the laminate. The reduced diameter hunting arrow shaft is receptive of standard or non-standard internal components for increasing arrow penetration and shot accuracy. Moreover, a reprocessed semiconductor substrate is manufactured using the aforementioned method, and an SOI substrate is manufactured using the reprocessed semiconductor substrate.